IEEE - Institute of Electrical and Electronics Engineers, Inc. - Design-for-manufacturing features in nanometer processes - A reverse engineering perspective

2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2009)

Author(s): D. James
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2009
Conference Location: Berlin, Germany
Conference Date: 10 May 2009
Page(s): 56 - 61
ISBN (CD): 978-1-4244-3615-6
ISBN (Paper): 978-1-4244-3614-9
ISSN (Electronic): 2376-6697
ISSN (Paper): 1078-8743
DOI: 10.1109/ASMC.2009.5155953
Regular:

The first decade of the new millennium has seen the introduction of a suite of production disciplines known collectively as design for manufacturability (DFM). While there has been no formal... View More

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