IEEE - Institute of Electrical and Electronics Engineers, Inc. - Bottom Nitridation Engineering of Multi-Nitridation ONO Interpoly Dielectric for Highly Reliable and High Performance NAND Flash Memory

2009 IEEE International Memory Workshop (IMW)

Author(s): Liu, C.H. ; Lin, Y.M. ; Yin, D.Y. ; Tseng, G.H. ; Liaw, H.W. ; Wei, H.C. ; Chen, S.H. ; Chao, C.M. ; Hwang, H.P. ; Pittikoun, S. ; Aritome, S.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2009
Conference Location: Monterey, CA, USA, USA
Conference Date: 10 May 2009
Page(s): 1 - 2
ISBN (Paper): 978-1-4244-3762-7
DOI: 10.1109/IMW.2009.5090583
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