IEEE - Institute of Electrical and Electronics Engineers, Inc. - Multiscale modeling of atomic layer deposition processes

2009 American Control Conference (ACC-09)

Author(s): V. Dwivedi ; R.A. Adomaitis
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2009
Conference Location: St. Louis, MO, USA
Conference Date: 10 June 2009
Page(s): 2,495 - 2,500
ISBN (CD): 978-1-4244-4524-0
ISBN (Paper): 978-1-4244-4523-3
ISSN (Electronic): 2378-5861
ISSN (Uncategorized ISSN): 0743-1619
ISSN (Paper): 0743-1619
DOI: 10.1109/ACC.2009.5160582
Regular:

A multiscale simulator for alumina film growth inside a nanoporous material during an atomic layer deposition process is developed. The model combines a continuum description at the macroscopic... View More

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