IEEE - Institute of Electrical and Electronics Engineers, Inc. - Gas flow rate effects from a Z-pinch discharge plasma on extreme ultraviolet emission

2009 Canadian Conference on Electrical and Computer Engineering (CCECE)

Author(s): Zhang, C.H. ; Lv, P. ; Katsuki, S. ; Akiyama, H.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2009
Conference Location: St. John's, NL, Canada, Canada
Conference Date: 3 May 2009
Page(s): 958 - 961
ISBN (CD): 978-1-4244-3508-1
ISBN (Paper): 978-1-4244-3509-8
ISSN (Paper): 0840-7789
DOI: 10.1109/CCECE.2009.5090270
Regular:

Extreme ultraviolet (EUV) radiation with wavelengths of 11 to 14 nm is seen as the most promising candidate for a new lithographic technology. Compared to synchrotron radiation sources and laser... View More

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