American Vacuum Society (AVS) - Investigation of CMP on GaN substrate for led manufacturing

2015 International Conference on Planarization/CMP Technology (ICPT)

Author(s): Hua Gong ; Guoshun Pan ; Chunli Zou ; Dan Guo ; Yuhong Liu
Publisher: American Vacuum Society (AVS)
Publication Date: 1 September 2015
Conference Location: Chandler, AZ, USA
Conference Date: 30 September 2015
Page(s): 1 - 4
ISBN (Electronic): 978-1-6195-6510-4

The relationship between the surface characterization of GaN substrates after chemical mechanical polishing (CMP) and the pH value of CMP slurry under acidic conditions was investigated in detail.... View More