Taiwan Semiconductor Industry Association - Capacitance density and breakdown voltage improvement by optimizing the PECVD dielectric film characteristics in metal insulator metal capacitors-Chin-Tsan Yeh

2015 Joint e-Manufacturing and Design Collaboration Symposium (eMDC) & 2015 International Symposium on Semiconductor Manufacturing (ISSM)

Author(s): Szu-Ming Chu ; Tunn Louh ; Ling-Wuu Yang ; Tahone Yang ; Kuang-Chao Chen
Publisher: Taiwan Semiconductor Industry Association
Publication Date: 1 September 2015
Conference Location: Taipei, Taiwan
Conference Date: 2 September 2015
Page(s): 1 - 4
ISBN (Electronic): 978-9-8691-7151-9
Regular:

Metal-insulator-metal (MIM) capacitors play an important role in the fields of power management IC and LCD gate driver components. [1-2] MIM is a capacitor that consists of two metal layers... View More

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