IEEE - Institute of Electrical and Electronics Engineers, Inc. - “Crack-photolithography” for high-throughput nanopatterning and nanofluidic applications

2015 Transducers - 18th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS)

Author(s): Minseok Kim ; Dogyeong Ha ; Taesung Kim
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 June 2015
Conference Location: Anchorage, AK, USA
Conference Date: 21 June 2015
Page(s): 1,366 - 1,369
ISBN (Electronic): 978-1-4799-8955-3
ISSN (Electronic): 2164-1641
DOI: 10.1109/TRANSDUCERS.2015.7181186
Regular:

We present an innovative cracking-assisted nanofabrication technique that relies only on a standard photolithography (photoresist patterning) process. This novel technique produces... View More

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