IEEE - Institute of Electrical and Electronics Engineers, Inc. - An Electron Undulating Ring for VLSI Lithography

Author(s): T. Tomimasu ; T. Noguchi ; S. Sugiyama ; T. Yamazaki ; T. Mikado
Sponsor(s): IEEE Nuclear and Plasma Sciences Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 October 1985
Volume: 32
Page(s): 3,403 - 3,405
ISSN (Paper): 0018-9499
ISSN (Online): 1558-1578
DOI: 10.1109/TNS.1985.4334382
Regular:

The development of the ETL storage ring "TERAS" as an undulating ring has been continued to achieve a wide area exposure of synchrotron radiation (SR) in VLSI lithography. Stable vertical and... View More

Advertisement