IEEE - Institute of Electrical and Electronics Engineers, Inc. - Comparison of the effects of oxygen on cobalt and cobalt-chromium thin films

Author(s): J. Thompson ; D. Stevenson
Sponsor(s): IEEE Magnetics Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 September 1985
Volume: 21
Page(s): 1,441 - 1,443
ISSN (Paper): 0018-9464
ISSN (Online): 1941-0069
DOI: 10.1109/TMAG.1985.1064015
Regular:

Oxygen has been intentionally incorported into sputtered Co and Co-Cr films by the addition of controlled amounts of oxygen to the argon sputter gas atmosphere. The influence of the oxygen... View More

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