IEEE - Institute of Electrical and Electronics Engineers, Inc. - Plasma dry etching for selective emitter formation in crystalline silicon based solar cell

2008 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD'08)

Author(s): M. Tucci ; L. Serenelli ; A. Del Bono ; M. Izzi ; L. Pirozzi ; P. Martufi ; A. Sanseverino
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2008
Conference Location: Sydney, NSW, Australia
Conference Date: 28 July 2008
Page(s): 273 - 276
ISBN (CD): 978-1-4244-2717-8
ISBN (Paper): 978-1-4244-2716-1
ISSN (Paper): 1097-2137
DOI: 10.1109/COMMAD.2008.4802145
Regular:

Selective emitter formation in silicon based solar cell is recently becoming a common technique to enhance the blue response of solar cell. In this work, we suggest a novel procedure based on a... View More

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