IEEE - Institute of Electrical and Electronics Engineers, Inc. - Lithium niobate surface structuration for phononic crystal fabrication

2008 IEEE International Ultrasonics Symposium

Author(s): S. Benchabane ; L. Robert ; G. Ulliac ; S. Queste ; A. Khelif ; V. Laude
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2008
Conference Location: Beijing, China
Conference Date: 2 November 2008
Page(s): 2,201 - 2,204
ISBN (CD): 978-1-4244-2480-1
ISBN (Paper): 978-1-4244-2428-3
DOI: 10.1109/ULTSYM.2008.0545
Regular:

Reactive ion etching (RIE) has been used to etch micron-sized holes which are several microns in depth in lithium niobate, mostly on Y- and Y-rotated cut substrates, the underlying idea being the... View More

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