IEEE - Institute of Electrical and Electronics Engineers, Inc. - National project on 45 to 32 nm metal oxide semiconductor field effect transistors for next century IC fabrications

2008 IEEE International Conference on Electron Devices and Solid-State Circuits

Author(s): Huey-liang Hwang ; C.W. Wang ; K.H. Chang ; C.H. Tsai ; K.C. Leou ; Kuei-Shu Chang-Liao ; Chun-Chang Lu ; S.C. Chang ; F.C. Chiu ; C.H. Liu ; A. Chin ; Kow-Ming Chang ; Bwo-Ning Chen
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2008
Conference Location: Hong Kong, China
Conference Date: 8 December 2008
Page(s): 1 - 5
ISBN (CD): 978-1-4244-2540-2
ISBN (Paper): 978-1-4244-2539-6
DOI: 10.1109/EDSSC.2008.4760691
Regular:

It is well known that the Taiwan Semiconductor industries play the very key roles for the worldwide IC foundry, and the advanced research of nanoelectronics is the lifeline for its long term... View More

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