IEEE - Institute of Electrical and Electronics Engineers, Inc. - Layer Curing for Masked Projection Stereolithography: the effects of varying irradiance distributions

2008 15th International Conference on Mechatronics and Machine Vision in Practice

Author(s): J. Potgieter ; J.R. Zyzalo ; O. Diegel ; W.L. Xu
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2008
Conference Location: Auckland, New Zealand
Conference Date: 2 December 2008
Page(s): 604 - 609
ISBN (CD): 978-0-473-13532-4
ISBN (Paper): 978-1-4244-3779-5
DOI: 10.1109/MMVIP.2008.4749599
Regular:

Recent stereolithography rapid prototyping advancements have been in the area of microstereolithography. Microstereolithography incorporates an integral curing approach to the... View More

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