IEEE - Institute of Electrical and Electronics Engineers, Inc. - Three level masking for improved aspect ratio InP-based photonic crystals

2008 IEEE 20th International Conference on Indium Phosphide & Related Materials (IPRM)

Author(s): F. Karouta ; B. Docter ; E.J. Geluk ; M.K. Smit ; P. Kaspar
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: Versailles, France
Conference Date: 25 May 2008
Page(s): 1 - 4
ISBN (CD): 978-1-4244-2259-3
ISBN (Paper): 978-1-4244-2258-6
ISSN (Paper): 1092-8669
DOI: 10.1109/ICIPRM.2008.4703034
Regular:

A three-level masking technique is used to improve the aspect ratio of InP-based photonic crystals. The masking consists of a ZEP/Cr/SiOx stack where the ZEP layer is used to open the... View More

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