IEEE - Institute of Electrical and Electronics Engineers, Inc. - Double patterning technology friendly detailed routing

2008 IEEE/ACM International Conference on Computer-Aided Design (ICCAD)

Author(s): Minsik Cho ; Yongchan Ban ; D.Z. Pan
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2008
Conference Location: San Jose, CA, USA
Conference Date: 10 November 2008
Page(s): 506 - 511
ISBN (CD): 978-1-4244-2820-5
ISBN (Paper): 978-1-4244-2819-9
ISSN (Paper): 1092-3152
DOI: 10.1109/ICCAD.2008.4681622
Regular:

Double patterning technology (DPT) is a most likely lithography solution for 32/22 nm technology nodes as of 2008 due to the delay of extreme ultra violet lithography. However, it should hurdle... View More

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