IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication of Channel and Wedge Plasmon Polarition Devices by Combined UV and Nanoimprint Lithography

2008 Conference on Lasers and Electro-Optics (CLEO)

Author(s): R.B. Nielsen ; A. Boltasseva ; A. Kristensen ; S.I. Bozhevolnyi ; V.S. Volkov ; I.F. Cuesta ; A. Klukowska
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: San Jose, CA, USA
Conference Date: 4 May 2008
Page(s): 1 - 2
ISBN (Paper): 978-1-55752-859-9
Regular:

We present a large-scale compatible fabrication method for channel and wedge plasmon polariton waveguides. Optical characterization of fabricated devices using SNOM shows sub-wavelength... View More

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