IEEE - Institute of Electrical and Electronics Engineers, Inc. - Resonantly enhanced near-field lithography

2008 Conference on Lasers and Electro-Optics (CLEO)

Author(s): Mankei Tsang ; D. Psaltis
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: San Jose, CA, USA
Conference Date: 4 May 2008
Page(s): 1 - 2
ISBN (Paper): 978-1-55752-859-9
Regular:

We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by... View More

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