IEEE - Institute of Electrical and Electronics Engineers, Inc. - Micro- and nanostructures inside sapphire by fs-laser irradiation and selective etching

2008 Conference on Lasers and Electro-Optics (CLEO)

Author(s): D. Wortmann ; J. Gottmann ; N. Brandt ; H. Horn-Solle
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: San Jose, CA, USA
Conference Date: 4 May 2008
Page(s): 1 - 2
ISBN (Paper): 978-1-55752-859-9
Regular:

Micro- and nanofabrication of cavities in the volume of sapphire was performed by femtosecond laser irradiation followed by chemical etching with aqueous solution of HF acid. Depending on the... View More

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