IEEE - Institute of Electrical and Electronics Engineers, Inc. - PEEL modeling and reduction studies based on nonuniform mesh and Arnoldi algorithm
2008 1st Asia-Pacific Symposium on Electromagnetic Compatibility (APEMC) & 19th International Zurich Symposium on Electromagnetic Compatibility
Author(s): | Pan Qijun ; Ma Weiming ; Zhao Zhihua ; Meng Jin ; Zhang Lei ; Tang Jian |
Publisher: | IEEE - Institute of Electrical and Electronics Engineers, Inc. |
Publication Date: | 1 May 2008 |
Conference Location: | Singapore, Singapore |
Conference Date: | 19 May 2008 |
Page(s): | 714 - 717 |
ISBN (CD): | 978-981-08-0629-3 |
DOI: | 10.1109/APEMC.2008.4559975 |
Regular:
With the increase of the conductor dimensions and the considered frequencies, the effective mesh and model reduction approaches must be studied. Based on the current distribution regularity of a... View More