IEEE - Institute of Electrical and Electronics Engineers, Inc. - PEEL modeling and reduction studies based on nonuniform mesh and Arnoldi algorithm

2008 1st Asia-Pacific Symposium on Electromagnetic Compatibility (APEMC) & 19th International Zurich Symposium on Electromagnetic Compatibility

Author(s): Pan Qijun ; Ma Weiming ; Zhao Zhihua ; Meng Jin ; Zhang Lei ; Tang Jian
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: Singapore, Singapore
Conference Date: 19 May 2008
Page(s): 714 - 717
ISBN (CD): 978-981-08-0629-3
DOI: 10.1109/APEMC.2008.4559975
Regular:

With the increase of the conductor dimensions and the considered frequencies, the effective mesh and model reduction approaches must be studied. Based on the current distribution regularity of a... View More

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