IEEE - Institute of Electrical and Electronics Engineers, Inc. - Investigation of the influence of process and design on soft error rate in integrated CMOS technologies thanks to Monte Carlo simulation

2008 IEEE International Reliability Physics Symposium (IRPS)

Author(s): C. Weulersse ; A. Bougerol ; G. Hubert ; F. Wrobel ; T. Carriere ; R. Gaillard ; N. Buard
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 2008
Conference Location: Phoenix, AZ, USA
Conference Date: 27 April 2008
Page(s): 729 - 730
ISBN (CD): 978-1-4244-2050-6
ISBN (Paper): 978-1-4244-2049-0
DOI: 10.1109/RELPHY.2008.4559010
Regular:

This work shows the capabilities of Monte Carlo simulation based on nuclear database to identify the influence of device parameters and process on Single Cell Upset and Multicell Upset rates in... View More

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