IEEE - Institute of Electrical and Electronics Engineers, Inc. - Influence of pre-existing and generated traps on reliability in HfSiON/SiO 2 stacks with fluorine incorporation

2008 IEEE International Reliability Physics Symposium (IRPS)

Author(s): I. Hirano ; T. Yamaguchi ; Yasushi Nakasaki ; K. Sekine ; Y. Mitani
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 April 2008
Conference Location: Phoenix, AZ, USA
Conference Date: 27 April 2008
Page(s): 659 - 660
ISBN (CD): 978-1-4244-2050-6
ISBN (Paper): 978-1-4244-2049-0
DOI: 10.1109/RELPHY.2008.4558975
Regular:

In this paper, we investigate the correlation between traps and the degradation of reliability in HfSiON/SiO2 stacks with F incorporation. It was found that the nature of generated... View More

Advertisement