IEEE - Institute of Electrical and Electronics Engineers, Inc. - Non-contact measurement of thickness uniformity of chemically etched Si membranes by fiber-optic low-coherence interferometry

2008 26th International Conference on Microelectronics

Author(s): Z. Djinovic ; M. Tomic ; L. Manojlovic ; Z. Lazic ; M.M. Smiljanic
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 2008
Conference Location: Nis, Serbia & Montenegro
Conference Date: 11 May 2008
Page(s): 321 - 324
ISBN (CD): 978-1-4244-1882-4
ISBN (Paper): 978-1-4244-1881-7
DOI: 10.1109/ICMEL.2008.4559286
Regular:

In this paper we present a contactless technique for thickness measurement of chemically etched Si membranes. This technique is based on low-coherence interferometry performed by single-mode... View More

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