IEEE - Institute of Electrical and Electronics Engineers, Inc. - Predictive models and CAD methodology for pattern dependent variability

13th Asia and South Pacific Design Automation Conference ASP-DAC 2008

Author(s): N. Verghese ; R. Rouse ; P. Hurat
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2008
Conference Location: Seoul, South Korea
Conference Date: 21 March 2008
Page(s): 213 - 218
ISBN (CD): 978-1-4244-1922-7
ISBN (Paper): 978-1-4244-1921-0
DOI: 10.1109/ASPDAC.2008.4483943
Regular:

Lithography, etch and stress are dominant effects impacting the functionality and performance of designs at 65 nm and below. This paper discusses pattern dependent variability caused by these... View More

Advertisement