IEEE - Institute of Electrical and Electronics Engineers, Inc. - The combination of proton-exchange technique and electron-beam lithography for integrated waveguides

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Author(s): Minh-Hang Nguyen ; Rong-Jinn Shieh ; Zhen-Ren Chen ; Fan-Gang Tseng
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2008
Conference Location: Sanya, China
Conference Date: 6 January 2008
Page(s): 1,134 - 1,137
ISBN (CD): 978-1-4244-1908-1
ISBN (Paper): 978-1-4244-1907-4
DOI: 10.1109/NEMS.2008.4484517
Regular:

We proposed a new method to fabricate waveguides with low loss and reduced dimension. This method combines the conventional proton-exchange technique for long straight segments of waveguide made... View More

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