IEEE - Institute of Electrical and Electronics Engineers, Inc. - Nanopatterning and the flexible stamp replication using thermal and roll typed UV-NIL

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Author(s): SooYeon Park ; KeeBong Choi ; GeeHong Kim ; JaeJong lee
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2008
Conference Location: Sanya, China
Conference Date: 6 January 2008
Page(s): 280 - 283
ISBN (CD): 978-1-4244-1908-1
ISBN (Paper): 978-1-4244-1907-4
DOI: 10.1109/NEMS.2008.4484335
Regular:

In case of UV-Nanoimprint Lithography, a transparent quartz stamp with nano-scale patterns has the problems that are difficult to fabricate, handle and keep. Also, it's very expensive to fabricate... View More

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