IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new micro/nano-lithography based on contact transfer of thin film and mask embedded lithography

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Author(s): Yung-Chun Lee ; Cheng-Yu Chiu ; Shuo Hung Chang
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2008
Conference Location: Sanya, China
Conference Date: 6 January 2008
Page(s): 239 - 242
ISBN (CD): 978-1-4244-1908-1
ISBN (Paper): 978-1-4244-1907-4
DOI: 10.1109/NEMS.2008.4484326
Regular:

This paper presents a new nanoimprint method based on the Contact Transfer and Mask Embedded Lithography (CMEL) technique. In CMEL process, a thin metal film is deposited on the silicon mold... View More

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