IEEE - Institute of Electrical and Electronics Engineers, Inc. - Oxidation of high area ratio silicon microchannels fabricated by electrochemical etching

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Author(s): Xiaoming Chen ; Jilei Lin ; Shaohui Xu ; Peisheng Xin ; Lianwei Wang
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2008
Conference Location: Sanya, China
Conference Date: 6 January 2008
Page(s): 78 - 81
ISBN (CD): 978-1-4244-1908-1
ISBN (Paper): 978-1-4244-1907-4
DOI: 10.1109/NEMS.2008.4484290
Regular:

Silicon microchannel structures exhibit numerous possible applications. In this report, the oxidation of high area ratio silicon microchannels used in weak light detection and night vision is... View More

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