IEEE - Institute of Electrical and Electronics Engineers, Inc. - RF magnetron sputtered aluminum oxide films for MEMS

2007 International Workshop on Physics of Semiconductor Devices (IWPSD '07)

Author(s): S. Chandra ; V. Gupta ; V. Bhatt
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 December 2007
Conference Location: Mumbai, India
Conference Date: 16 December 2007
Page(s): 682 - 685
ISBN (CD): 978-1-4244-1728-5
ISBN (Paper): 978-1-4244-1727-8
DOI: 10.1109/IWPSD.2007.4472611
Regular:

In the present work, aluminum oxide (AL2O3) films have been investigated as an alternative structural material for micro-electro-mechanical-systems (MEMS). The... View More

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