IEEE - Institute of Electrical and Electronics Engineers, Inc. - Quick Cavity Filling in UV-Nanoimprint Using Pentafluoropropane

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H. Hiroshima
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 446 - 447
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456296
Regular:

UV-nanoimprint in air suffers the bubble defect problem. It was found that bubble elimination can be completed in several seconds by pentafluoropropane even where bubbles remain in 10 min in air.... View More

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