IEEE - Institute of Electrical and Electronics Engineers, Inc. - A Novel Contact Imprinting Lithography for Nano-Patterning and Nano-Fabrication

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): Y.-C. Lee ; C.-Y. Chili
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 444 - 445
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456295
Regular:

This paper reports a simple but useful contact printing method for micro-and nano-patterning and fabrication. In this method, a silicon mold with some micro/nano-features is first coated with an... View More

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