IEEE - Institute of Electrical and Electronics Engineers, Inc. - Optimal resist dispensing in step and flash NIL

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): V. Sirotkin ; A. Svintsov ; S. Zaitsev
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 406 - 407
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456276
Regular:

Development of algorithm for drop dispensing optimization in ultraviolet nanoimprint lithography (UV-NIL) considering optimal filling of a stamp is reported.

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