IEEE - Institute of Electrical and Electronics Engineers, Inc. - The IMPRINT software: quantitative predictions of the residual resist thickness in nanoimprint

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): N. Kehagias ; V. Reboud ; C.M.S. Torres ; V. Sirotkin ; A. Svintsov ; S. Zaitsev
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 404 - 405
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456275
Regular:

With the aim of optimizing the stamp geometry, a refined model for simultaneous calculation of the resist viscous flow in nanoimprint lithography (NIL) and the stamp/substrate deformation has been... View More

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