IEEE - Institute of Electrical and Electronics Engineers, Inc. - Sub-resolution Assist Features in Photolithography Process Simulation

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): Jianliang Li ; L.S. Melvin
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 394 - 395
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456270
Regular:

Summary form only given. As modern photolithography feature sizes reduce, the use of sub-resolution assist features (SRAFs) to improve the manufacturing process window has become more prevalent.... View More

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