IEEE - Institute of Electrical and Electronics Engineers, Inc. - Morphology and growth behavior of P-type Si macropores in submicronmeter prepattern

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): G.L. Lai ; I.C. Leu ; M.H. Hon
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 392 - 393
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456269
Regular:

This paper studies the pore morphology and growth behavior of p-type silicon macropores in submicronmeter prepattern by electrochemistry method. It was found that only random macropores with an... View More

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