IEEE - Institute of Electrical and Electronics Engineers, Inc. - A Novel Projection Exposure System Using a Gradient-Index Lens Array

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H. Kobayashi ; T. Horiuchi
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 370 - 371
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456258
Regular:

A novel projection exposure system using a gradient-index lens array was proposed, and the patterning characteristics were investigated. The guaranteed MTF value of the Gradient-index lens array... View More

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