IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication of nanostencil using size reduction of micro-aperture by additional deposition

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): J.S. Lee ; W.B. Park ; C.W. Park ; G.M. Kim
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 190 - 191
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456168
Regular:

A low-cost method for nanostencil fabrication is demonstrated. The micro-stencils were fabricated by means of standard MEMS processes of conventional photolithography and bulk etching of Si... View More

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