IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication of GaInAsP/InP Arbitrary Shaped Low Dimensional Quantum Structures

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): D. Plumwongrot ; Y. Tamura ; T. Maruyama
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 156 - 157
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456151
Regular:

Fabrication processes of GalnAsP/InP arbitrary shaped low dimensional quantum structures using electron beam (EB) lithography, Ti-mask lift-off and reactive ion etching (RIE)-dry etching is... View More

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