IEEE - Institute of Electrical and Electronics Engineers, Inc. - Guided formation of sub-10 nm silicide dot array and their morphology change by electron beam irradiation

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): J.-S. Wi ; H.-M. Kim ; H.-S. Lee ; S.-W. Nam ; K.-B. Kim
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 152 - 153
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456149
Regular:

We present a method for the formation of sub-10 nm scale silicide dots by applying e-beam energy. Our process demonstrates a hybrid approach which combines the "top down approach" -defining the... View More

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