IEEE - Institute of Electrical and Electronics Engineers, Inc. - Characterization of deposited materials formed by focused ion beam-induced chemical vapor deposition using an AuSi alloyed metal source

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): T. Yo ; H. Tanaka ; K. Koreyama ; T. Nagata ; Y. Sakuma ; K. Nakajima ; T. Chikyow ; J. Yanagisawa ; A. Sakai
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 150 - 151
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456148
Regular:

In this paper deposited materials using focused ion beam-induced chemical vapor deposition (FIB-CVD) in an AuSi alloyed metal source was investigated. Results using Au and Si FIB-CVD were almost... View More

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