IEEE - Institute of Electrical and Electronics Engineers, Inc. - Ab-initio Calculations of Stress Effects on Indium Diffusion in Uniaxally Strained Silicon

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): Young-Kyu Kim ; Bum-Goo Cho ; Soon-Yeol Park ; Taeyoung Won
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 118 - 119
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456132
Regular:

This paper investigates tensile uniaxial strain effects on indium atom migration for researching shallow junction devices by using ab-initio calculation. This study reveals which tensile strain on... View More

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