IEEE - Institute of Electrical and Electronics Engineers, Inc. - Resist Processes for High Resolution Mask and Direct Write Applications Using the Latest Vistec VSB Electron Column

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H. Sailera ; M. Irmscher ; C. Hohle ; K. Keil ; M. Boettcher ; P. Hahmann
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 82 - 83
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456115
Regular:

Summary form given only. High resolution variable shaped beam (VSB) electron lithography becomes more and more important for chip and mask making. The use for direct write of critical layers, at... View More

Advertisement