IEEE - Institute of Electrical and Electronics Engineers, Inc. - Electron beam lithography simulation for the patterning of EUV masks

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): N. Tsikrikas ; G.P. Patsis ; E. Valamontes ; I. Raptis ; A. Gerardino
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 68 - 69
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456108
Regular:

The effect of the number of layers of the Mo/Si structure and their relative thickness in terms of incident electron energy, on the backscattering coefficient and on the deposited energy in the... View More

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