IEEE - Institute of Electrical and Electronics Engineers, Inc. - Analysis of Electron Beam Sensitivity of Self-Assembled Monolayer Resist Depending on Terminal Group

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): K. Kato ; T. Miyake ; Y. Beppu ; T. Tanii ; Ohdomari
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 60 - 61
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456104
Regular:

Organosilane self-assembled monolayers (SAMs) have been utilized as one of the candidate for electron beam (EB) resist. Hydroxy-terminated SAM is much more sensitive to EB than vinyl-terminated... View More

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