IEEE - Institute of Electrical and Electronics Engineers, Inc. - The Study of Graytone Mask Structure for Manufacturing Thin Film Transistor

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H.J. Kang ; H.S. Cha ; J.H. Ahn ; H. Ryu ; S.W. Kim ; K.S. Nam
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 58 - 59
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456103
Regular:

Three types of GTM structures for reduction technology of TFT-LCD manufacturing process are studied. Through a simulation results, it is confirmed that the slit transmittance modulation (TM) mask... View More

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