IEEE - Institute of Electrical and Electronics Engineers, Inc. - Dual grating interferometric lithography for 22-nm node

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H. Shiotani ; S. Suzuki ; Dong Gun Lee ; P. Naulleau
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 46 - 47
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456097
Regular:

Dual grating interferometric (DGI) lithography which can be operate in the usage of an incoherent EUV light source is proposed. Thus, the DGI exposure method can combine with a stand alone EUV... View More

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