IEEE - Institute of Electrical and Electronics Engineers, Inc. - Dependence of EUV emission on xenon flow rate from a z-pinch discharge plasma

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): C.H. Zhang ; S. Katsuki ; A. Kimura ; H. Akiyama
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 44 - 45
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456096
Regular:

This paper describes the dependence of EUV emission from a Z-pinch plasma discharge on gas flow rate. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of... View More

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