IEEE - Institute of Electrical and Electronics Engineers, Inc. - Development of a LPP EUV light source for below-32nm Node Lithography

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): D. Brandt ; T. Oga ; N. Farrar ; J. Bonafede
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 32 - 33
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456090
Regular:

A comprehensive review of the development activities being undertaken at Cymer in the development of a CO2 laser produced plasma (LPP) light source for EUV lithography is provided. A... View More

Advertisement