IEEE - Institute of Electrical and Electronics Engineers, Inc. - Laser produced plasma light source for HVM-EUVL

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): H. Komori ; H. Hoshino ; T. Suganuma ; K. Nowak ; T. Yabu ; T. Asayama ; Y. Ueno ; M. Moriya ; M. Nakano ; H. Someya ; T. Abe ; G. Soumagne ; A. Endo ; H. Mizoguchi ; A. Sumitani ; K. Toyoda
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 30 - 31
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456089
Regular:

A major technical challenge of an extreme ultraviolet (EUV) light source for microlithography at 13.5 nm is the in-band power requirement of more than 115 W at the intermediate focus. The solution... View More

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