IEEE - Institute of Electrical and Electronics Engineers, Inc. - Development status of Nikon EUV exposure tools

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): K. Murakami
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 24
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456086
Regular:

Extreme ultra violet lithography (EUVL) is widely regarded as the lithography technology to succeed optical lithography. In this paper, updated development status of Nikon's EUVL process... View More

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