IEEE - Institute of Electrical and Electronics Engineers, Inc. - Reaction mechanism of EUV resists

Microprocesses and Nanotechnology 2007. 20th International Microprocesses and Nanotechnology Conference

Author(s): M. Toriumi ; K. Kaneyama ; T. Itani
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 November 2007
Conference Location: Kyoto, Japan
Conference Date: 5 November 2007
Page(s): 16 - 17
ISBN (Paper): 978-4-9902472-4-9
DOI: 10.1109/IMNC.2007.4456082
Regular:

In this paper, the deprotection kinetics in polyphenol-molecular resist and phenol-resin resist materials induced by the EUV exposure and the vacuum effect on the dissolution during the... View More

Advertisement